发明名称 Calibration method for a lithographic apparatus and device manufacturing method
摘要 A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.
申请公布号 US2005024643(A1) 申请公布日期 2005.02.03
申请号 US20040871699 申请日期 2004.06.21
申请人 BLEEKER ARNO JAN;VAN BUEL HENRICUS WILHELMUS MARIA;LOF JOERI 发明人 BLEEKER ARNO JAN;VAN BUEL HENRICUS WILHELMUS MARIA;LOF JOERI
分类号 H01L21/027;G03F7/20;G03F9/00;(IPC1-7):G03F9/00;G03C5/00;G01B11/00 主分类号 H01L21/027
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