| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device by which the responsiveness of radiation cooling is improved and a place of cooling can be changed over. SOLUTION: In the exposure device for exposing a substrate, the exposure device has a cooling means 106 for radiation-cooling the substrate and a changing means 104 for changing the quantity of the radiation of the cooling means. The temperature of a radiating plate is controlled by feeding back a temperature measured by a temperature sensor 109 by a control mechanism not shown. Piping 120 for making a refrigerant body flow is formed at the rear of a Peltier element 105 as a temperature control mechanism. COPYRIGHT: (C)2005,JPO&NCIPI
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