发明名称 SOLUTION-PROCESSED THIN FILM TRANSISTOR FORMATION METHOD
摘要 An exemplary solution-processed thin film transistor formation method of the invention forms solution-processed thin film layers into a transistor structure. During formation, semiconductor portions of the transistor structure are selectively heated via a laser to modify the material state of semiconductor material from a solution deposited material state to a thin film layer material state.
申请公布号 US2005026344(A1) 申请公布日期 2005.02.03
申请号 US20030633208 申请日期 2003.07.31
申请人 WENG JIAN-GANG;KWASNY DAVID M.;ORR DAVID 发明人 WENG JIAN-GANG;KWASNY DAVID M.;ORR DAVID
分类号 H01L51/00;H01L51/05;H01L51/30;H01L51/40;(IPC1-7):H01L21/00 主分类号 H01L51/00
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