发明名称 Precursor mixtures for use in preparing layers on substrates
摘要 Methods of forming a layer on a substrate using complexes of Formula I. The complexes and methods are particularly suitable for the preparation of semiconductor structures. The complexes are of the formula LyMYz (Formula I) wherein: M is a metal; each L group is independently a neutral ligand containing one or more Lewis-base donor atoms; each Y group is independently an anionic ligand; y=a nonzero integer; and z=a nonzero integer corresponding to the valence state of the metal.
申请公布号 US2005022738(A1) 申请公布日期 2005.02.03
申请号 US20040931868 申请日期 2004.09.01
申请人 MICRON TECHNOLOGY, INC. 发明人 VAARTSTRA BRIAN A.
分类号 C23C16/40;C30B25/02;H01L21/314;H01L21/316;(IPC1-7):C23C16/00 主分类号 C23C16/40
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