发明名称 |
Method for high aspect ratio pattern transfer |
摘要 |
The present invention relates a method for high aspect ratio pattern transfer, by using combination of imprint and Step and Flash techniques to transfer high aspect ratio pattern. The present invention simultaneously saves the developing time and the amount of developer used during the photo-resist pattern transfer process. The present invention is able to avoid separation and dissolution between pattern and substrate that is attacked by developer, and is able to yield high aspect ratio patterns.
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申请公布号 |
US2005026090(A1) |
申请公布日期 |
2005.02.03 |
申请号 |
US20040781870 |
申请日期 |
2004.02.20 |
申请人 |
NATIONAL CHENG KUNG UNIVERSITY |
发明人 |
LIAO WENG-CHUNG;HSU LIEN-CHUNG;LEE PO-I;HON MIN-HSIUNG;HONG CHAU-NAN |
分类号 |
G03C1/76;G03F1/14;G03F7/00;H01L21/027;(IPC1-7):G03C1/76 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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