发明名称 METHOD OF ADJUSTING SUBSTRATE TREATMENT EQUIPMENT, ADJUSTMENT HOLDER USED FOR IT, AND HYBRID HOLDER
摘要 PROBLEM TO BE SOLVED: To accurately adjust a position relation of a substrate and an opposite member. SOLUTION: A first adjustment holder 50 is held in a spin chuck 1. The holder 50 has a body 51 having the same shape and size as a wafer, and light projecting parts 52A, 53A and 54A, and light receiving parts 52B, 53B and 54B attached to the body 51. Second adjusting holders 62, 63 and 64 are arranged on the first adjustment holder 50. The holders 62, 63 and 64 form a reference gap between the holders and the surface of the body 51. Light receiving light amount data of the light receiving parts 52B, 53B and 54B in a state that the second adjustment holders 62, 63 and 64 are arranged in the body 51 of the first adjustment holder 50 are stored to a temporary storage memory 97 as a reference value. Thereafter, the second adjustment holders 62, 63 and 64 are removed to make a shielding plate approach the body 51, and the position and attitude of the shielding plate are adjusted so that the light receiving light amount data of the light receiving parts 52B, 53B and 54B are values in the neighborhood of the reference value. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005032913(A) 申请公布日期 2005.02.03
申请号 JP20030195008 申请日期 2003.07.10
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NAKAGAWA HITOSHI
分类号 H01L21/68;H01L21/027;H01L21/304;H01L21/306;H01L21/683;(IPC1-7):H01L21/68 主分类号 H01L21/68
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