发明名称 |
MATERIAL FOR FORMING BLACK MATRIX |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material for forming a black matrix to obtain a black matrix having high resolution and high light shielding property in a simplified process. <P>SOLUTION: The material for forming a black matrix essentially contains the following two layers and comprises two ore more layers. The essential layers are: (a) a photosensitive resin layer which has a wavelength region with ≤2 optical density for light in a 300 nm to 650 nm wavelength and which can be patterned by UV rays or visible rays; and (b) a light shielding layer having no wavelength region with ≤2 optical density for light in a 420 nm to 650 nm wavelength region. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005031575(A) |
申请公布日期 |
2005.02.03 |
申请号 |
JP20030273482 |
申请日期 |
2003.07.11 |
申请人 |
ASAHI KASEI ELECTRONICS CO LTD |
发明人 |
KURITA EITETSU;IGARASHI TSUTOMU |
分类号 |
G03F7/004;G02B5/00;G02B5/20;G02F1/1335;G03F7/11;G03F7/40 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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