发明名称 MATERIAL FOR FORMING BLACK MATRIX
摘要 <P>PROBLEM TO BE SOLVED: To provide a material for forming a black matrix to obtain a black matrix having high resolution and high light shielding property in a simplified process. <P>SOLUTION: The material for forming a black matrix essentially contains the following two layers and comprises two ore more layers. The essential layers are: (a) a photosensitive resin layer which has a wavelength region with &le;2 optical density for light in a 300 nm to 650 nm wavelength and which can be patterned by UV rays or visible rays; and (b) a light shielding layer having no wavelength region with &le;2 optical density for light in a 420 nm to 650 nm wavelength region. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005031575(A) 申请公布日期 2005.02.03
申请号 JP20030273482 申请日期 2003.07.11
申请人 ASAHI KASEI ELECTRONICS CO LTD 发明人 KURITA EITETSU;IGARASHI TSUTOMU
分类号 G03F7/004;G02B5/00;G02B5/20;G02F1/1335;G03F7/11;G03F7/40 主分类号 G03F7/004
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