| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of recovering after maintenance of a plasma processing apparatus, which can further shorten release time after wet cleaning without leakage for the maintenance accompanied by an exposure to the atmosphere of a vacuum treatment chamber such as wet cleaning. SOLUTION: A function of predeterming the occurrence of leakage until a specified pressure is reached, a function of accelerating discharge of a residual gas in a chamber before and after a diagnosis of a sign of the leakage, and an exhausting sequence such as cycle purging are added, thereby allowing the device to be recovered in a short time while automatically or semiautomatically determining the acceptance. COPYRIGHT: (C)2005,JPO&NCIPI
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