| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for charged particle beam exposure by which exposure can be performed while a stage is operated for acceleration and deceleration. SOLUTION: An optical irradiation system of the exposure device has a main deflector which deflects a lighting beam toward each subfield of a reticle and a blanking deflector which blanks the lighting beam so that the beam may not hit the reticle. When the moving speed Vrs of the stage is slow while the stage is operated for acceleration and deceleration, an exposure time at every subfield is fixed by making longer a time (deflected stay time) tsf during which the main deflector is set in a deflected state toward one of the subfields by changing a blanking time by controlling the blanking deflector. Since the exposure can be performed while a wafer stage and a reticle stage are operated for acceleration and deceleration, the throughput of the exposure device can be improved. COPYRIGHT: (C)2005,JPO&NCIPI
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