发明名称 |
Thyistor-based SRAM and method using quasi-planar finfet process for the fabrication thereof |
摘要 |
A method for manufacturing an integrated circuit structure includes providing a semiconductor substrate and forming a horizontal semiconductor fin on top of the semiconductor substrate. An access transistor gate and a thyristor gate are then formed on top of the semiconductor substrate and in contact with the horizontal semiconductor fin. An access transistor is formed from at least a portion of the horizontal semiconductor fin and the access transistor gate. A thyristor is formed from at least a portion of the horizontal semiconductor fin and the thyristor gate, the access transistor being in contact with the thyristor.
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申请公布号 |
US2005026343(A1) |
申请公布日期 |
2005.02.03 |
申请号 |
US20030629041 |
申请日期 |
2003.07.28 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
QUEK ELGIN;ZHENG JIA ZHEN;YELEHANKA PRADEEP R.;LI WEINING |
分类号 |
H01L21/336;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L21/332 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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