发明名称 FILM FORMING METHOD, DEVICE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a film forming method which can correspond to minute pattern forming and the reduction of the amount of a material to be used and can stably form a film at a desired position on a substrate. <P>SOLUTION: The method includes a process for arranging first droplets 11 on the substrate 20, a process for drying the first droplets to form a dry film 12 in which the edge is thicker than the middle, and a process in which second droplets 13 are arranged in an area surrounded by the edge part of the dry film 12 of the first droplets, and the dry film 14 of the second droplets is formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005028276(A) 申请公布日期 2005.02.03
申请号 JP20030195825 申请日期 2003.07.11
申请人 SEIKO EPSON CORP 发明人 MASUDA TAKASHI
分类号 G02B5/20;B05D1/26;B05D3/02;B05D7/00;H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J11/38;H01J11/40;H01J11/42;H01J17/04;H01L21/288;H01L21/3205;H01L21/768;(IPC1-7):B05D3/02 主分类号 G02B5/20
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