发明名称 |
CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam exposure apparatus for exposing a desired pattern by suppressing the generation of other aberrations when performing an astigmatic correction of an electronic optical system for contraction. SOLUTION: The apparatus includes a beam shaping optical system 2 for forming an image SI of a charged particle source radiating a charged particle beam; an aperture array 5 and an electrostatic lens 6 for forming images of a plurality of charged particle sources from the image SI; a reducing electronic optical system 8 for contraction projecting a reduced size of the images of the plurality of charged particle sources on a wafer 9; and a first stigmeter 3 for generating astigmatic aberrations when the optical system 2 forms the image SI so as to correct the astigmatic aberrations which are generated in the optical system 8 for contraction. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005032480(A) |
申请公布日期 |
2005.02.03 |
申请号 |
JP20030193834 |
申请日期 |
2003.07.08 |
申请人 |
CANON INC;HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MURAKI MASATO;KAMIMURA OSAMU |
分类号 |
G03F7/20;H01J37/153;H01J37/305;H01L21/027;(IPC1-7):H01J37/153 |
主分类号 |
G03F7/20 |
代理机构 |
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