| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device for a microstructure whereby a contamination caused by a toxic substance leaking from the cleaning device can be minimized and a human body is hardly affected in the cleaning device for removing an unwanted substance adhering to the microstructure by fluidizing, under high pressure, a cleaning agent composition essentially containing carbon dioxide and a cleaning component and bringing the composition into contact with the microstructure. SOLUTION: The cleaning device removes an unwanted substance adhering to the microstructure by fluidizing, under high pressure, the cleaning agent composition essentially containing carbon dioxide and the cleaning component and bringing the composition into contact with the microstructure. In a cleaning process performed by the cleaning device, the toxic substance is present anywhere on the cleaning device. Of the cleaning device, a part where the toxic substance is likely to leak is housed in an enclosed structure comprising a first evacuating means. COPYRIGHT: (C)2005,JPO&NCIPI
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