| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam device in which installing space does not become large, and which gives freedom of design, and furthermore position correction of an electrode plate can be made, and in which leakage into the sample room is prevented. SOLUTION: In the charged particle beam device which is provided with a charged particle beam source, an irradiation lens system to control charged particle beams 21 emitted from the charged particle beam source and to irradiate them onto a sample, a sample stage to place the sample, and an electrode plate 31 which is arranged between the irradiation lens system and the sample stage, which has an aperture 31a to make the charged particle beams 21 pass, and to which a prescribed electric potential is applied, the electrode plate 31 is supported by a piezoelectric element part 33. COPYRIGHT: (C)2005,JPO&NCIPI
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