发明名称 Semiconductor memory device with memory cells operated by boosted voltage
摘要 A memory using an SRAM memory cell intended for low-voltage operation is designed to decrease the threshold value of MOS transistors constituting the memory cell without substantial decrease in the static noise margin, which is the operational margin of the memory cell. To this end, a voltage Vdd' higher than a power supply voltage Vdd of a power supply line for peripheral circuits is supplied from a power supply line for memory cells as a power supply voltage for memory cells. Since the conductance of driver MOS transistors is increased, the threshold voltage of the MOS transistors within the memory cells can be reduced without reducing the static noise margin. Further the ratio of width between the driver MOS transistor and a transfer MOS transistor can be set to 1, thereby allowing a reduction in the memory cell area.
申请公布号 US2005024917(A1) 申请公布日期 2005.02.03
申请号 US20040926032 申请日期 2004.08.26
申请人 HITACHI, LTD. 发明人 YAMAOKA MASANAO;OSADA KENICHI;ISHIBASHI KOICHIRO
分类号 G11C11/413;G11C11/41;G11C11/412;G11C11/417;H01L21/8244;H01L27/10;H01L27/11;(IPC1-7):G11C11/22 主分类号 G11C11/413
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