| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processor for which the surface wave electric field strength on the inner side is strengthened, distribution in a radial direction is adjusted and especially uniformity is improved. <P>SOLUTION: The surface wave plasma processor of this invention is constituted of a plasma processing chamber, a part of which is formed of a dielectric window where microwaves can be transmitted, a support body of a base body to be processed installed inside the plasma processing chamber, an introduction means of a gas for plasma processing into the plasma processing chamber, an exhaust means for evacuating the inside of the plasma processing chamber, and a microwave introduction means using a multi-slot antenna arranged on the outer side of the dielectric window facing the supporting body of the base body to be processed. For the slot, a circular arcuate slot is provided together with a radial slot. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
