| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a glass mask for exposure with which a substrate can be exposed to a plurality of patterns by a single exposure even when the pattern is large in size and therefore, the cost of exposure can be reduced. <P>SOLUTION: A plurality of glass masks 14 each having an exposure pattern 12 formed thereon are connected and fixed while the patterns 12 are positioned so as to obtain the glass mask having the plurality of patterns 12 as a whole. By using the mask, a substrate can be exposed to the plurality of the patterns 12 by a single exposure. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
