发明名称 |
Method for producing an antifuse structure and antifuse |
摘要 |
The invention relates to a method for producing an antifuse structure in a substrate, a conductive region and a nonconductive region adjoining the latter being formed in the substrate, so that an edge of the conductive region is produced, a dielectric layer being deposited in such a way that it covers at least a part of the edge.
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申请公布号 |
US2005023637(A1) |
申请公布日期 |
2005.02.03 |
申请号 |
US20030724009 |
申请日期 |
2003.11.26 |
申请人 |
LINDOLF JURGEN;SCHAMBERGER FLORIAN |
发明人 |
LINDOLF JURGEN;SCHAMBERGER FLORIAN |
分类号 |
H01L23/525;(IPC1-7):H01L29/00 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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