发明名称 Method for producing an antifuse structure and antifuse
摘要 The invention relates to a method for producing an antifuse structure in a substrate, a conductive region and a nonconductive region adjoining the latter being formed in the substrate, so that an edge of the conductive region is produced, a dielectric layer being deposited in such a way that it covers at least a part of the edge.
申请公布号 US2005023637(A1) 申请公布日期 2005.02.03
申请号 US20030724009 申请日期 2003.11.26
申请人 LINDOLF JURGEN;SCHAMBERGER FLORIAN 发明人 LINDOLF JURGEN;SCHAMBERGER FLORIAN
分类号 H01L23/525;(IPC1-7):H01L29/00 主分类号 H01L23/525
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