EVAPORATION SOURCE MOVING MECHANISM OF VACUUM VAPOR DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a mechanism for adjusting the position of an evaporation source by an operation from the outside of a vacuum tank during a film deposition process. SOLUTION: An evaporation source moving mechanism of a vacuum vapor deposition apparatus is provided with: a cylinder 25 installed at a lower part of a vacuum tank; a piston 13 which is elevated/lowered in an airtight manner inside the cylinder by using airtight means 26 and 27; and a rotary drum 12 which is fitted to the piston and elevated/lowered integrally with the piston. The rotary drum is connected to a rotational-drive source 24 and rotated in an airtight manner independently of the piston. An evaporation source is disposed above the rotary drum, and the evaporation source is elevated/lowered by the elevating/lowering drive of the piston. The evaporation source is rotated by the rotational drive of the rotary drum. COPYRIGHT: (C)2005,JPO&NCIPI