发明名称 VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus developed for producing a phosphor or a scintillator plate. SOLUTION: The invention is a vapor deposition apparatus, developed in particular for on-line deposition of phosphor or scintillator material, wherein said vapor deposition apparatus comprises a crucible containing a mixture of raw materials, a chimney having at least one inlet in communication with the said crucible and a linear slot, one or more linear heating elements, contained within said chimney, an oven surrounding said crucible, wherein said oven contains heating elements, shielding elements and cooling elements. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005029895(A) 申请公布日期 2005.02.03
申请号 JP20040197688 申请日期 2004.07.05
申请人 AGFA GEVAERT NV 发明人 VERREYKEN GUIDO;BLUYS PETER;RUDY HENDRICKX;LUCAS PEETERS;LAMOTTE JOHAN
分类号 G21K4/00;C09K11/08;C23C14/06;C23C14/24;C23C14/50;C23C14/54;G01T1/20;(IPC1-7):C23C14/24 主分类号 G21K4/00
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