| 发明名称 |
Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus |
| 摘要 |
A method of forming a predetermined pattern by disposing a functional liquid on a substrate, the method includes the steps of forming banks on the substrate, and disposing the functional liquid on a region divided by the banks, wherein a width of the region is partially formed so as to be large.
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| 申请公布号 |
US2005022374(A1) |
申请公布日期 |
2005.02.03 |
| 申请号 |
US20040849001 |
申请日期 |
2004.05.20 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;MIKOSHIBA TOSHIAKI |
| 分类号 |
H05B33/10;B05D1/26;G02F1/1345;G09F9/30;H01L21/288;H01L21/3205;H01L21/336;H01L21/48;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L29/417;H01L29/786;H01L51/00;H01L51/50;H01L51/56;H05K3/12;(IPC1-7):H01R43/00 |
主分类号 |
H05B33/10 |
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