Method and apparatus for cleaning a substrate by using a supercritical fluid

摘要

The present invention is related to a method and apparatus for the cleaning of a substrate, in particular a semiconductor substrate. The method comprises the steps of introducing the substrate in a container, bringing said container into a given condition in terms of pressure and temperature, subjecting said substrate to a rotary movement, and spraying a supercritical fluid or a mixture of a supercritical fluid and a co-solvent onto the surface of said rotating substrate. The invention is equally related to an apparatus for performing the method of the invention.