发明名称 METHOD FOR MANUFACTURING MASK FOR EVAPORATION, CAPABLE OF IMPROVING PROCESS PRECISION AND WORKABILITY AND PREVENTING DEFORMATION OF THIN SUBSTRATE, AND MASK FOR EVAPORATION
摘要 PURPOSE: A method and a mask for evaporation are provided to achieve improved process precision and workability, and prevent a deformation of a thin substrate. CONSTITUTION: A method comprises a step of using a thin substrate material(30) which is formed by stacking a first metal layer(32) and a second metal layer(34), and an intermediate layer(36) interposed between the first and second metal layers, forming an aperture portion at the first metal layer so as to allow for passage of an evaporation material by etching the thin substrate material, and forming an aperture portion at the second metal layer such that a rim portion remains in the region other than the aperture portion of the first metal layer; and a step of removing the exposed portion of the intermediate layer by melting the exposed portion through the use of a predetermined liquid chemical.
申请公布号 KR20050013064(A) 申请公布日期 2005.02.02
申请号 KR20040030378 申请日期 2004.04.30
申请人 DAINIPPON SCREEN SEIJO K.K 发明人 ICHINOBE, NOBUO;MAEOKA, ATSUSHI;OMOTO, KOICHI;TONOGAI, SEIJI
分类号 H05B33/10;C23C14/04;C23C14/24;C23F1/00;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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