摘要 |
PURPOSE: A ceramic wafer for preparatory deposition is provided to improve the reliability of a preparatory deposition process by forming a plurality of roughness types for increasing the surface area on the ceramic wafer. CONSTITUTION: The ceramic wafer(180) is used for the preparatory deposition process. The plurality of roughness types(180a) are formed on the ceramic wafer. The plurality of roughness types may be a plurality of concentric types whose diameter becomes larger as it goes from the center of the ceramic wafer to the edge of the ceramic wafer.
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