发明名称 |
Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof |
摘要 |
A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.
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申请公布号 |
US6849957(B2) |
申请公布日期 |
2005.02.01 |
申请号 |
US20000725853 |
申请日期 |
2000.11.30 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
TAKEUCHI MASAHIKO;NARIMATSU KOICHIRO;UENO ATSUSHI |
分类号 |
H01L21/66;G03F9/00;H01L21/027;H01L21/822;H01L23/544;H01L27/04;(IPC1-7):H01L23/544 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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