| 发明名称 |
Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 摘要 |
A composition and process for wet stripping removal of sacrificial anti-reflective silicate material, e.g., from a substrate or article having such material deposited thereon, particularly where the sacrificial anti-reflective material is present with permanent silicate materials desired to be unaffected by the wet stripping composition.
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| 申请公布号 |
US6849200(B2) |
申请公布日期 |
2005.02.01 |
| 申请号 |
US20020201340 |
申请日期 |
2002.07.23 |
| 申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
BAUM THOMAS H.;BERNHARD DAVID;MINSEK DAVID;MURPHY MELISSA |
| 分类号 |
C03C15/00;C09K13/08;G03F7/42;H01L21/306;H01L21/308;H01L21/311;(IPC1-7):C09K13/00 |
主分类号 |
C03C15/00 |
| 代理机构 |
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