发明名称 |
METHOD FOR DRY-ETCHING MAGNETIC MATERIAL FOR REDUCING ETCHING DAMAGE DEGRADING MAGNETIC PROPERTY OF MAGNETIC MATERIAL |
摘要 |
PURPOSE: A method for dry-etching a magnetic material is provided to reduce an etching damage degrading magnetic property of the magnetic material by etching the magnetic material using an inorganic material. CONSTITUTION: A plasma of an etching gas is formed by using an alcohol having at least one hydroxyl group used as the etching gas. The magnetic material is dry-etched by using a mask material made of a non-organic material. The alcohol used as the etching gas preferably has one hydroxyl group. The etching gas is an alcohol selected from the group consisting of methanol(CH3OH), ethanol(C2H5OH) and propanol(C3H7OH). |
申请公布号 |
KR20050012144(A) |
申请公布日期 |
2005.01.31 |
申请号 |
KR20040056832 |
申请日期 |
2004.07.21 |
申请人 |
ANELVA CORPORATION |
发明人 |
HIROMI, TAICHI;KODAIRA, YOSHIMITSU |
分类号 |
C23F4/00;G11C11/16;H01F41/30;H01L21/3065;H01L43/08;H01L43/12;(IPC1-7):H01L21/306 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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