发明名称 METHOD FOR DRY-ETCHING MAGNETIC MATERIAL FOR REDUCING ETCHING DAMAGE DEGRADING MAGNETIC PROPERTY OF MAGNETIC MATERIAL
摘要 PURPOSE: A method for dry-etching a magnetic material is provided to reduce an etching damage degrading magnetic property of the magnetic material by etching the magnetic material using an inorganic material. CONSTITUTION: A plasma of an etching gas is formed by using an alcohol having at least one hydroxyl group used as the etching gas. The magnetic material is dry-etched by using a mask material made of a non-organic material. The alcohol used as the etching gas preferably has one hydroxyl group. The etching gas is an alcohol selected from the group consisting of methanol(CH3OH), ethanol(C2H5OH) and propanol(C3H7OH).
申请公布号 KR20050012144(A) 申请公布日期 2005.01.31
申请号 KR20040056832 申请日期 2004.07.21
申请人 ANELVA CORPORATION 发明人 HIROMI, TAICHI;KODAIRA, YOSHIMITSU
分类号 C23F4/00;G11C11/16;H01F41/30;H01L21/3065;H01L43/08;H01L43/12;(IPC1-7):H01L21/306 主分类号 C23F4/00
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