发明名称 FOCUS MONITORING METHOD USING MULTI-PHASE FOR CHECKING EASILY VARIATION OF FOCUS
摘要 PURPOSE: A focus monitoring method is provided to check easily the variation of focus by using a predetermined phase shift mask. CONSTITUTION: A phase shift focus monitoring mask(100) with a plurality of phases is provided. When focus is consistent, a chrome pattern(114) becomes a rectangle type structure. When focus is inconsistent, the chrome pattern deforms. Whether defocus is generated or not is checked by inspecting the shape of the chrome pattern using a microscope.
申请公布号 KR20050011102(A) 申请公布日期 2005.01.29
申请号 KR20030049944 申请日期 2003.07.21
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 CHOI, SEON HO
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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