发明名称 |
FOCUS MONITORING METHOD USING MULTI-PHASE FOR CHECKING EASILY VARIATION OF FOCUS |
摘要 |
PURPOSE: A focus monitoring method is provided to check easily the variation of focus by using a predetermined phase shift mask. CONSTITUTION: A phase shift focus monitoring mask(100) with a plurality of phases is provided. When focus is consistent, a chrome pattern(114) becomes a rectangle type structure. When focus is inconsistent, the chrome pattern deforms. Whether defocus is generated or not is checked by inspecting the shape of the chrome pattern using a microscope.
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申请公布号 |
KR20050011102(A) |
申请公布日期 |
2005.01.29 |
申请号 |
KR20030049944 |
申请日期 |
2003.07.21 |
申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
CHOI, SEON HO |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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