发明名称 |
SINGLE SEMICONDUCTOR MANUFACTURING APPARATUS CAPABLE OF SETTING UP SUBSTRATE SUPPORTING CONDITIONS ACCORDING TO DEGREE OF WARPAGE IN SUBSTRATE |
摘要 |
PURPOSE: A single semiconductor manufacturing apparatus is provided to prevent the warpage of a semiconductor substrate regardless of the size by setting up substrate supporting conditions according to the degree of warpage in the substrate using a substrate supporting assembly and an interval controlling unit. CONSTITUTION: A single semiconductor manufacturing apparatus includes a reaction chamber(10), a substrate supporting assembly and an interval controlling unit. The substrate supporting assembly(30) includes a first substrate support part(31) for supporting a center portion of the substrate and a second substrate support part(35) for supporting an edge portion of the substrate. The interval controlling unit(50) is installed under the substrate supporting assembly to control independently the first and second substrate support parts according to the size of the substrate.
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申请公布号 |
KR20050011162(A) |
申请公布日期 |
2005.01.29 |
申请号 |
KR20030050146 |
申请日期 |
2003.07.22 |
申请人 |
TERASEMICON CORPORATION |
发明人 |
JANG, TAEK YONG;YOO, JEONG HO |
分类号 |
H01L21/324;(IPC1-7):H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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