发明名称 SINGLE SEMICONDUCTOR MANUFACTURING APPARATUS CAPABLE OF SETTING UP SUBSTRATE SUPPORTING CONDITIONS ACCORDING TO DEGREE OF WARPAGE IN SUBSTRATE
摘要 PURPOSE: A single semiconductor manufacturing apparatus is provided to prevent the warpage of a semiconductor substrate regardless of the size by setting up substrate supporting conditions according to the degree of warpage in the substrate using a substrate supporting assembly and an interval controlling unit. CONSTITUTION: A single semiconductor manufacturing apparatus includes a reaction chamber(10), a substrate supporting assembly and an interval controlling unit. The substrate supporting assembly(30) includes a first substrate support part(31) for supporting a center portion of the substrate and a second substrate support part(35) for supporting an edge portion of the substrate. The interval controlling unit(50) is installed under the substrate supporting assembly to control independently the first and second substrate support parts according to the size of the substrate.
申请公布号 KR20050011162(A) 申请公布日期 2005.01.29
申请号 KR20030050146 申请日期 2003.07.22
申请人 TERASEMICON CORPORATION 发明人 JANG, TAEK YONG;YOO, JEONG HO
分类号 H01L21/324;(IPC1-7):H01L21/324 主分类号 H01L21/324
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