发明名称 |
METHOD OF MANUFACTURING FLASH OR EEPROM CELL WITH ENHANCED FLOATING GATE FOR ACQUIRING EXCELLENT ON/OFF PROPERTIES |
摘要 |
PURPOSE: A method of manufacturing a flash or EEPROM(Electrically Erasable Programmable Read Only Memory) cell is provided to improve on/off properties by arranging a floating gate around a control gate. CONSTITUTION: A control gate oxide layer(102), a control gate electrode(104) and an insulating layer(106) are sequentially formed on a silicon substrate(100). A floating gate oxide layer is formed thereon. A floating gate electrode(108) for surrounding the control gate electrode is formed on the resultant structure by performing predetermined etching processes on a polysilicon layer. A source and drain junction(112) are formed in the substrate to align the gate structure.
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申请公布号 |
KR20050011107(A) |
申请公布日期 |
2005.01.29 |
申请号 |
KR20030049949 |
申请日期 |
2003.07.21 |
申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
JEON, SEONG DO |
分类号 |
H01L27/115;(IPC1-7):H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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