发明名称 METHOD OF MANUFACTURING FLASH OR EEPROM CELL WITH ENHANCED FLOATING GATE FOR ACQUIRING EXCELLENT ON/OFF PROPERTIES
摘要 PURPOSE: A method of manufacturing a flash or EEPROM(Electrically Erasable Programmable Read Only Memory) cell is provided to improve on/off properties by arranging a floating gate around a control gate. CONSTITUTION: A control gate oxide layer(102), a control gate electrode(104) and an insulating layer(106) are sequentially formed on a silicon substrate(100). A floating gate oxide layer is formed thereon. A floating gate electrode(108) for surrounding the control gate electrode is formed on the resultant structure by performing predetermined etching processes on a polysilicon layer. A source and drain junction(112) are formed in the substrate to align the gate structure.
申请公布号 KR20050011107(A) 申请公布日期 2005.01.29
申请号 KR20030049949 申请日期 2003.07.21
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 JEON, SEONG DO
分类号 H01L27/115;(IPC1-7):H01L27/115 主分类号 H01L27/115
代理机构 代理人
主权项
地址