发明名称 |
CMOS TFT AND DISPLAY DEVICE USING THE SAME FOR ELIMINATING ABSOLUTE VALUE DIFFERENCE BETWEEN THRESHOLD VOLTAGES OF P-TYPE TFT AND N-TYPE TFT BY ADJUSTING SHAPES OF GRAINS INCLUDED IN ACTIVE CHANNEL |
摘要 |
PURPOSE: A CMOS TFT AND a display device using the same for eliminating an absolute value difference between threshold voltages of a P-type TFT and an N-type TFT and increase a degree of current migration by adjusting shapes of grains included in an active channel. CONSTITUTION: A polysilicon grain formed in an active channel of a P-type TFT has an anisotropic grain structure. A polysilicon grain formed in an active channel of an N-type TFT has an isotropic grain structure. A size of the polysilicon grain having the anisotropic grain structure is larger than a size of the polysilicon grain having the isotropic grain structure.
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申请公布号 |
KR20050011602(A) |
申请公布日期 |
2005.01.29 |
申请号 |
KR20030050772 |
申请日期 |
2003.07.23 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
KOO, JAE BON;LEE, KI YONG;LEE, UL HO;PARK, HYE HYANG;PARK, JI YONG |
分类号 |
H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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