METHOD OF FORMING FINE CONTACT HOLE TO RESTRAIN SIDE-LOBE EFFECT AND IMPROVE RESOLUTION

摘要

PURPOSE: A method of forming a fine contact hole is provided to restrain a side-lobe effect and improve resolution by using a wet-developable BARC(Bottom Anti-Reflection Coating) layer as a patterning layer. CONSTITUTION: A wet-developable BARC layer(102) is formed on a silicon substrate(100). The silicon substrate including the BARC layer is heated at a predetermined temperature. A photoresist is coated on the BARC layer. An exposure process for the silicon substrate is performed. A developing process for the silicon substrate is performed to form a contact hole(108) having a predetermined shape on the BARC layer. The photoresist is removed therefrom.