METHOD OF CRYSTALLIZING AMORPHOUS SILICON, MASK PATTERN, AND FLAT PANEL DISPLAY DEVICE USING POLYSILICON THIN FILM FABRICATED THEREBY TO REDUCE TACT TIME

摘要

PURPOSE: A method of crystallizing amorphous silicon, a mask pattern, and a flat panel display device using a polysilicon thin film fabricated thereby are provided to simplify a fabrication process and reduce a tact time by performing simultaneously a process for crystallizing amorphous silicon and a dehydrogenation process. CONSTITUTION: A method of crystallizing amorphous silicon is performed by using a mask having a first mask pattern for crystallizing amorphous silicon on one mask by irradiating same laser beams and a second mask pattern for performing a dehydrogenation process. In the process for irradiating the laser beams, the first mask pattern and the second mask pattern are applied sequentially.