METHOD OF FORMING CAPACITOR MONITOR PATTERN OF SEMICONDUCTOR DEVICE FOR IMPROVING UNIFORMITY OF MPS MONITOR PATTERN TO MONITOR GRADE OF MPS

摘要

PURPOSE: A method of forming a capacitor monitor pattern of a semiconductor device is provided to improve uniformity of an MPS(Meta Stable Silicon) monitor pattern by restraining residues of polymers generated from a monitor pattern region. CONSTITUTION: An insulating layer is formed on a semiconductor substrate. A hardmask is formed on the insulating layer. A monitor pattern region is opened by etching the insulating layer. A fine insulating layer pattern is formed on the monitor pattern region. The hardmask is removed therefrom. The semiconductor substrate is cleaned and the fine insulating layer pattern is removed to open the monitor pattern region. A bottom electrode(23A) is formed on the monitor pattern region. An MPS(24) is formed on a surface of the bottom electrode.