Fabrication of an epitaxial layer on a thin support layer produced in a substrate by implantation of atomic species, for optic, opto-electronic and electronic applications

摘要

The fabrication of an epitaxial layer (6) consists of: (a) impanting some atomic species into a support substrate (1) to define a fragile zone (12) delimiting a thin support layer (13) from the rest (11) of the substrate; (b) growing the epitaxial layer by epitaxy either directly on the thin support layer or on an intercalary layer (5, 23, 31, 32) carried on it; (c) detaching the rest of the substrate from the thin support layer, along the fragile zone, by a firm provision of external energy.