Scattered light inspection of the objective surface of the field-closest lens of a projection objective of a microlithography projection illumination system by use of an optical inspection unit mounted in the reticule holder

摘要

Device for scattered light inspection of optical elements has a light generating unit (2) for generation of light that is to be radiated on to the surface of an optical element (9) that is to be inspected and a detector (4) for detection of scattered light (14) that is reflected from the optical element. At least some of the components (3-8) of the inspection device are mounted in a housing (1) that is dimensioned so that it can be held in a reticule mounting and or a substrate mounting of a lithography illumination system.