| 摘要 |
A method and system of optimizing a state change can include isolating a load at a first state, such as a wafer cassette, a wafer photoresist, a prosthetic device, or other device to be implanted, in a load lock of a wafer implanter, and bringing the load from the first state to a lock set point state, such as by pumping down the load lock to vacuum. The load may then be exposed to an environment at a second state, such as in an implant chamber with conditions desirable for implanting, that may be disturbed by the exposing, and the second state may then re-established. The time to re-establish the second state may be optimized as a function of the time to reach the lock set point state. For the implanter, the time to first implant may be optimized as a function of pump down time. |
