发明名称 |
METHODS FOR DEFECT DETECTION AND PROCESS MONITORING BASED ON SEM IMAGES |
摘要 |
A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image. |
申请公布号 |
WO2005008223(A2) |
申请公布日期 |
2005.01.27 |
申请号 |
WO2004US23024 |
申请日期 |
2004.07.15 |
申请人 |
APPLIED MATERIALS ISRAEL, LTD.;APPLIED MATERIALS, INC.;KARSENTI, LAURENT |
发明人 |
KARSENTI, LAURENT |
分类号 |
G01N21/00;G06T5/30;G06T7/00;H01J37/28 |
主分类号 |
G01N21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|