发明名称 METHODS FOR DEFECT DETECTION AND PROCESS MONITORING BASED ON SEM IMAGES
摘要 A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image.
申请公布号 WO2005008223(A2) 申请公布日期 2005.01.27
申请号 WO2004US23024 申请日期 2004.07.15
申请人 APPLIED MATERIALS ISRAEL, LTD.;APPLIED MATERIALS, INC.;KARSENTI, LAURENT 发明人 KARSENTI, LAURENT
分类号 G01N21/00;G06T5/30;G06T7/00;H01J37/28 主分类号 G01N21/00
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