RADIATION EMISSION SEMICONDUCTOR CHIP, MANUFACTURING METHOD THEREFOR, AND METHOD FOR ADJUSTING AND SETTING BRIGHTNESS THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor chip structure which enables radiation emission to be adjusted and set to a target range during the manufacturing period of the semiconductor chip.

SOLUTION: The brightness of a radiation emission semiconductor chip is adjusted and set in the manufacturing period of the semiconductor chip after measuring the radiation emission property of a wafer's radiation emission semiconductor layer row (3), by providing to the wafer's radiation outputting bonded surface (10) one or a plurality of absorbing and/or partially insulating brightness adjusting and setting layers (12, 6, and 9).

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