发明名称 CLEANING AGENT FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning agent for cleaning a substrate in a short time. SOLUTION: Disclosed is a cleaning agent for substrates which contains a compound represented by the general formula shown. In the formula, R<SP>1</SP>to R<SP>3</SP>are independently hydrogen, hydroxy group, an alkyl group, an alkenyl group, an alkynyl group, an acyl group, an alkoxy group, an amidyl group, a carboxy group, an alkoxy alkyl group, an alkyl sulfonyl group, a sulfonic acid group, or an aromatic substituent. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005026621(A) 申请公布日期 2005.01.27
申请号 JP20030270625 申请日期 2003.07.03
申请人 MITSUBISHI GAS CHEM CO INC 发明人 IKEMOTO KAZUTO
分类号 G03F7/42;B08B3/08;C11D7/22;C11D7/32;C11D7/50;H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 G03F7/42
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