发明名称 SELF-ADJUSTING BIPOLAR TRANSISTOR USING PROJECTING EXOGENOUS BASE EXTENSION, AND FORMATION METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a self-adjusting bipolar transistor structure having a projecting exogenous base provided with external and internal regions with different dope densities, and to provide its manufacturing method. SOLUTION: The first material of a first dope density is provided so that an exogenous base external region is formed. Then, a first opening is formed in the first material's layer by lithography into which a dummy emitter pedestal is formed, and by which a trench is formed between a side wall of the first opening and the dummy pedestal. Thereafter, the second material of a second dope density is provided within this trench, and another exogenous base internal extension region is formed whose projecting external base marginal part self-adjusts to a dummy pedestal marginal part. Since the emitter is formed where there were the dummy pedestals, this exogenous base also self-adjusts to the emitter. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005026689(A) 申请公布日期 2005.01.27
申请号 JP20040192192 申请日期 2004.06.29
申请人 INTERNATL BUSINESS MACH CORP 发明人 GREGORY G FREEMAN;KHATER MARWAN H;PAGETTE FRANCOIS
分类号 H01L29/737;H01L21/331;H01L21/8222;H01L29/10;H01L29/732;(IPC1-7):H01L21/331 主分类号 H01L29/737
代理机构 代理人
主权项
地址