| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of carrying out highly accurate measurement and control of an exposed amount without being affected by external disturbance light reflected in a mask, a projection lens, and a plate or the like. SOLUTION: The aligner is provided with an illumination optical system including a luminous quantity adjustment member 20 that is located in an optical path between a light source 4 and the mask M1, as optical system introducing the luminous quantity to the mask M1. The transmissivity of the luminous quantity emitted from the light source 4 thereof is changed by the position of the member 20 located in the optical path. The luminous quantity adjustment member 20 is configured such that at least one normal to an incident face and an emitting face of the member 20 is located obliquely with respect to the optical axis of the illumination optical system and movable along an in-face direction of the incident face or the emitting face. COPYRIGHT: (C)2005,JPO&NCIPI
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