发明名称 |
Methods of forming a semiconductor device including a metal silicide layer between a conductive plug and a bottom electrode of a capacitor |
摘要 |
Embodiments of the present invention include methods of forming a contact to a capacitor in a semiconductor device. A metal silicide layer is formed at a top surface of a conductive plug of the semiconductor device that is coupled to a bottom electrode of the capacitor to provide an ohmic contact therebetween. Forming a metal silicide layer may include exposing a surface of the conductive plug, depositing a metal layer of the bottom electrode on the exposed surface of the conductive plug and thermally processing the semiconductor device to react a part of the deposited metal layer and the conductive plug to form the metal silicide layer. Methods of forming a semiconductor device including a capacitor having a metal silicide layer connecting a bottom electrode of the capacitor and a conductive plug are also provided.
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申请公布号 |
US2005020066(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20040863828 |
申请日期 |
2004.06.08 |
申请人 |
CHOI JEONG-SIK;CHUNG JUNG-HEE;SHIM WOO-GWAN;KIM YOUNG-SUN;CHOI JAE-HYOUNG;OH SE-HOON;YOO CHA-YOUNG |
发明人 |
CHOI JEONG-SIK;CHUNG JUNG-HEE;SHIM WOO-GWAN;KIM YOUNG-SUN;CHOI JAE-HYOUNG;OH SE-HOON;YOO CHA-YOUNG |
分类号 |
H01L27/108;H01L21/02;H01L21/768;H01L21/8242;H01L21/8246;(IPC1-7):H01L21/20 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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