发明名称 Method of depositing coating by plasma; device for implementing the method and coating obtained by said method
摘要 A device for implementing a method for using low pressure plasma to deposit a coating on an object to be treated, the method including at least two steps: a first step during which reaction fluid is injected into a treatment zone at a first flow rate and under a given pressure, and a second step during which the same reaction fluid is injected into the treatment zone at a second flow rate lower than the first. The device includes a reactive fluid feed device having a source of reactive fluid, a flow regulator valve, and an injector that opens into the treatment area, and a controller that, during the transition between the first and second step, controls the regulator valve to cause a decrease in the flow of reactive fluid delivered to the treatment area.
申请公布号 US2005019481(A1) 申请公布日期 2005.01.27
申请号 US20040918373 申请日期 2004.08.16
申请人 SIDEL 发明人 OUTREMAN JEAN-TRISTAN;ADRIANSENS ERIC
分类号 B65D23/02;B65D25/14;C23C16/04;C23C16/26;C23C16/44;C23C16/455;C23C16/50;(IPC1-7):H05H1/00;B05D3/00 主分类号 B65D23/02
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