| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a gray tone mask of a halftone film type with which a high-quality TFT can be manufactured. <P>SOLUTION: The method includes processes of: preparing a mask blank having a semitransmitting film 22 and a light shielding film 23 successively layered on a transparent substrate 21; exposing a resist film including a step of forming a resist film on the mask blank and subjecting the part where a semitransmitting part is to be formed to exposure along a pattern smaller than the resolution limit of the exposure apparatus for the pattern exposure of the resist film; developing to form a resist pattern 24a having different film remaining rates of the resist between in the part where the light shielding part is to be formed and in the part where the semitransmitting part is to be formed; etching the light shielding film 23 and the semitransmitting film 22 by using the resist pattern 24a as a mask to form a light transmitting part; removing only the resist pattern remaining on the semitransmitting part; and etching the light shielding film 23a by using the remaining resist pattern as a mask to form a semitransmitting part. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
