发明名称 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
摘要 A substrate holding device has a base member which removably holds a plate having a contact member to come into contact with a substrate, a first attraction mechanism which attracts the substrate onto the plate, and a second attraction mechanism which attracts the plate onto the base member. In this arrangement, as the plate can be removed, time to remove contaminants is not required, and productivity can be improved. Further, as the plate on a flat plate can be attached/removed, plate exchange can be easily made.
申请公布号 US2005018169(A1) 申请公布日期 2005.01.27
申请号 US20040931984 申请日期 2004.09.02
申请人 发明人 MATSUI SHIN
分类号 G03F7/20;H01L21/027;H01L21/68;H01L21/683;H01L21/687;(IPC1-7):G03B27/58;G03B27/62 主分类号 G03F7/20
代理机构 代理人
主权项
地址