发明名称 |
METHOD FOR FORMING PATTERNS AND OPTICAL ELEMENT WITH THE PATTERN HAVING TWO REGION WHOSE REFRACTIVE INDEXS ARE DIFFERENT EACH OTHER |
摘要 |
PURPOSE: A method for forming patterns and an optical element with the pattern are provided to manufacture a pattern having a refractive index difference between high and low refractive regions greater than 0.1 by using various materials. CONSTITUTION: A photosensitive resin composition is applied on a semiconductor substrate. An exposed coating film is formed by illuminating radiation on a portion of a coating film. The exposed coating film is developed to form a pattern having a first coating portion and a non-coating portion. Resin liquid, made by dissolving a resin with a refractive index greater than that of the first coating portion in a solvent with a humidity lower than that of the first coating portion, is applied on the pattern to convert the non-coating portion to a second coating portion. Different refractive regions are formed on the first and second coating portions.
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申请公布号 |
KR20050010500(A) |
申请公布日期 |
2005.01.27 |
申请号 |
KR20040054321 |
申请日期 |
2004.07.13 |
申请人 |
JSR CORPORATION |
发明人 |
HANAMURA, MASAAKI;KUMANO, ATSUSHI;SHIRAKI, SHINJI |
分类号 |
C08J7/18;G02B6/13;G03F7/00;G03F7/004;G03F7/038;G03F7/40;(IPC1-7):G02B1/04 |
主分类号 |
C08J7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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