| 摘要 |
PROBLEM TO BE SOLVED: To pattern in a stable form of an unexposed part for fine patterning. SOLUTION: The exposure device is equipped with: a light source (101) which generates an exposure beam (102); a branching means (113, 114) which branches the exposure beam into a plurality of exposure beams (102a to 102c); a phase difference setting means (115) which variably sets phase differences in the plurality of branched exposure beams; an objective lens (109) which superposes the plurality of exposure beams with the phase difference set to form a synthesized exposure spot (110) on the exposure substrate; a modulator (104) which modulates the intensity of the synthesized exposure spot according to the pattern signal carrying the information of the pattern to be drawn; a beam profile selecting means (106a) which determines the phase differences among the exposure beams on the basis of the information of the pattern to be drawn, sets the phase difference in the phase difference setting means, and selects the beam profile of the synthesized exposure spot (110); and a scanning means (107, 121, 122) which relatively scans the exposure substrate with the plurality of exposure spots. COPYRIGHT: (C)2005,JPO&NCIPI
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