发明名称 INTERFERENCE FILTER, VARIABLE WAVELENGTH INTERFERENCE FILTER AND METHOD OF MANUFACTURING THE FILTERS
摘要 PROBLEM TO BE SOLVED: To provide an interference filter in which an optical gap, which is a parallel gap between two reflection films, can be accurately formed and kept, and to provide a variable wavelength interference filter and a method of manufacturing the filters. SOLUTION: In the interference filter which is formed by oppositely arranging two reflection films 16 and 19 with a predetermined parallel space, the reflection film 16 is formed on the bottom face 14 of a recessed part 13 which is formed on a silicone substrate or a SOI (silicon-on-insulator) substrate 11 by etching. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005024826(A) 申请公布日期 2005.01.27
申请号 JP20030189459 申请日期 2003.07.01
申请人 SEIKO EPSON CORP 发明人 KAMISUKE SHINICHI;MURATA AKIHIRO;YODA MITSUHIRO;NAKAMURA RYOSUKE
分类号 G02B5/28;G02B1/02;(IPC1-7):G02B5/28 主分类号 G02B5/28
代理机构 代理人
主权项
地址