| 摘要 |
A supercritical fluid cleaning system and method comprising mainly a pressure chamber (2), a closable lid, a substrate support for holding at least one substrate, a rotable shaft (14) extending outward from within the chamber, an external rotary power source coupled magnetically or otherwise to the shaft (14), and a rotable component or impeller (20) attached to the chamber end of the shaft in close proximity to the substrate holding position, and baffles (16) located close to the rotable component. The rotable component is configured for rotation within the supercritical phase fluid in the chamber close to the surface of the wafer for causing agitation and turbulent fluid flow against the surface of the substrate, and increased intra-chamber fluid circulation. |
